Sublimation and vapor deposition

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When the system pressure is below the triple point pressure, direct phase change between solid and vapor can occur. The process whereby solid is vaporized without going through the liquid phase is referred to as sublimation. The process whereby a vapor phase turns to solid is referred to as deposition, which is the opposite process of sublimation.<br>
When the system pressure is below the triple point pressure, direct phase change between solid and vapor can occur. The process whereby solid is vaporized without going through the liquid phase is referred to as sublimation. The process whereby a vapor phase turns to solid is referred to as deposition, which is the opposite process of sublimation.<br>
When the gaseous precursors are absorbed by a heated substrate – where a chemical reaction takes place – the nucleation and lattice incorporation leads to formation of a solid film. This process is referred to as Chemical Vapor Deposition (CVD).<br>
When the gaseous precursors are absorbed by a heated substrate – where a chemical reaction takes place – the nucleation and lattice incorporation leads to formation of a solid film. This process is referred to as Chemical Vapor Deposition (CVD).<br>
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*<b>[[Sublimation]]</b>
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:[[Boundary Conditions at Solid-Vapor Interface|Boundary condition at interface]], sublimation over a [[Sublimation over a Flat Plate|Flat Plate]] and in a [[Sublimation inside an Circular Tube|circular tube]], and [[Sublimation with Chemical Reaction|sublimation with chemical reaction]].
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*<b>[[Chemical Vapor Deposition (CVD)]]</b>
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:[[Basics of Chemical Vapor Deposition|Basics]], [[Governing Equations of Chemical Vapor Deposition|governing equations]], [[Transport Properties]], [[Chemical Vapor Deposition in Horizontal Reactor|CVD in horizontal reactor]], [[Chemical Vapor Deposition in Barrel Reactor|CVD in Barrel Reactor]], and [[Laser Chemical Vapor Deposition (LCVD)]].

Revision as of 15:01, 20 April 2009

When the system pressure is below the triple point pressure, direct phase change between solid and vapor can occur. The process whereby solid is vaporized without going through the liquid phase is referred to as sublimation. The process whereby a vapor phase turns to solid is referred to as deposition, which is the opposite process of sublimation.
When the gaseous precursors are absorbed by a heated substrate – where a chemical reaction takes place – the nucleation and lattice incorporation leads to formation of a solid film. This process is referred to as Chemical Vapor Deposition (CVD).

Boundary condition at interface, sublimation over a Flat Plate and in a circular tube, and sublimation with chemical reaction.
Basics, governing equations, Transport Properties, CVD in horizontal reactor, CVD in Barrel Reactor, and Laser Chemical Vapor Deposition (LCVD).