Sublimation and vapor deposition

From Thermal-FluidsPedia

(Difference between revisions)
Jump to: navigation, search
Line 10: Line 10:
<br>
<br>
Back to [[Multiphase Systems]]. <br>
Back to [[Multiphase Systems]]. <br>
-
Back to [[Thermalpedia]]
+
Back to [[Thermalpedia Main Page|Main Page]].

Revision as of 21:05, 30 August 2009

When the system pressure is below the triple point pressure, direct phase change between solid and vapor can occur. The process whereby solid is vaporized without going through the liquid phase is referred to as sublimation. The process whereby a vapor phase turns to solid is referred to as deposition, which is the opposite process of sublimation.
When the gaseous precursors are absorbed by a heated substrate – where a chemical reaction takes place – the nucleation and lattice incorporation leads to formation of a solid film. This process is referred to as Chemical Vapor Deposition (CVD).

Boundary condition at interface, sublimation over a flat plate and in a circular tube, and sublimation with chemical reaction.
Basics, governing equations, Transport Properties, CVD in horizontal reactor, CVD in Barrel Reactor, and Laser Chemical Vapor Deposition (LCVD).



Back to Multiphase Systems.
Back to Main Page.